Nanocrystalline CuO-CuFe2O4 composite thin films were developed from CuFeO2 ceramic target using a radio frequency sputtering method followed by a thermal oxidation process. This fabrication process helps to develop porous sensing layers which are highly desirable for solid state resistive gas sensors. Their sensing properties towards ethanol and hydrogen gas in dry air were examined at the operating temperatures ranging from 250 deg C to 500 deg C. The electrical transients during adsorption and desorption of the test gases were fitted with the Langmuir single site gas adsorption model. A composite thin film with a total thickness of 25 nm showed highest response (79%) towards hydrogen (500 ppm) at the operating temperature of 400 deg C. The shortest response time (tres) was found to be ~60 and ~90 seconds for hydrogen and ethanol respectively. The dependence of the response of the sensor on gas concentration (10-500 ppm) was also studied.
Cherenkov radiation provides a valuable way to identify high energy particles in a wide momentum range, through the relation between the particle velocity and the Cherenkov angle. However, since the Cherenkov angle depends only on material's permittivity, the material unavoidably sets a fundamental limit to the momentum coverage and sensitivity of Cherenkov detectors. For example, Ring Imaging Cherenkov detectors must employ materials transparent to the frequency of interest as well as possessing permittivities close to unity to identify particles in the multi GeV range, and thus are often limited to large gas chambers. It would be extremely important albeit challenging to lift this fundamental limit and control Cherenkov angles as preferred. Here we propose a new mechanism that uses constructive interference of resonance transition radiation from photonic crystals to generate both forward and backward Cherenkov radiation. This mechanism can control Cherenkov angles in a flexible way with high sensitivity to any desired range of velocities. Photonic crystals thus overcome the severe material limit for Cherenkov detectors, enabling the use of transparent materials with arbitrary values of permittivity, and provide a promising option suited for identification of particles at high energy with enhanced sensitivity.
In order to enhance the magnitude of spin-orbit torque (SOT), considerable experimental works have been devoted to studying the thickness dependence of the different layers in multilayers consisting of heavy metal (HM), ferromagnet (FM) and capping layers. Here we present a theoretical model based on the spin-drift-diffusion (SDD) formalism to investigate the effect of the capping layer properties such as its thickness on the SOT observed in experiments. It is found that the spin Hall-induced SOT can be significantly enhanced by incorporating a capping layer with opposite spin Hall angle to that of the HM layer. The spin Hall torque can be maximized by tuning the capping layer thickness. However, in the absence of the spin Hall effect (SHE) in the capping layer, the torque decreases monotonically with capping layer thickness. Conversely, the spin Hall torque is found to decrease monotonically with the FM layer thickness, irrespective of the presence or absence of SHE in the capping layer. All these trends are in correspondence with experimental observations. Finally, our model suggests that capping layers with long spin diffusion length and high resistivity would also enhance the spin Hall torque.
Magnetoresistive spin valve sensors based on the giant- (GMR) and tunnelling- (TMR) magnetoresisitve effect with a flux-closed vortex state free layer design are compared by means of sensitivity and low frequency noise. The vortex state free layer enables high saturation fields with negligible hysteresis, making it attractive for applications with a high dynamic range. The measured GMR devices comprise lower pink noise and better linearity in resistance but are less sensitive to external magnetic fields than TMR sensors. The results show a comparable detectivity at low frequencies and a better performance of the TMR minimum detectable field at frequencies in the white noise limit.
We investigate a generalized tomographic imaging framework applicable to a class of inhomogeneous media characterized by non-local diffusive energy transport. Under these conditions, the transport mechanism is well described by fractional-order continuum models capable of capturing anomalous diffusion that would otherwise remain undetected when using traditional integer-order models. Although the underlying idea of the proposed framework is applicable to any transport mechanism, the case of fractional heat conduction is presented as a specific example to illustrate the methodology. By using numerical simulations, we show how complex inhomogeneous media involving non-local transport, can be successfully imaged if fractional order models are used. In particular, results will show that by properly recognizing and accounting for the fractional character of the host medium not only allows achieving increased resolution but, in case of strong and spatially distributed non-locality, it represents the only viable approach to achieve a successful reconstruction.
Mask based pattern generation with photolithography is a crucial step in microchip production. The next generation Extreme Ultra Violet (EUV) lithography instruments with a wavelength of 13.5 nm is currently under development. In principle this allows patterning down to a few nm resolution in a single exposure. However, there are many technical challenges due to the very high energy of the photons among others. Lithography with metastable atoms has been suggested as a cost effective, less complex alternative to EUV lithography. The big advantage of atom lithography is that the kinetic energy of an atom is much smaller than that of a photon for a given wavelength. However up till now no method has been available for making masks for atom lithography that can produce arbitrary, high resolution patterns. Here we present a solution to this problem. We show that it is possible to make masks based on binary holography that can generate arbitrary patterns down to a few nm resolution using a state of the art metastable helium source. We compare the flux of this source with that of an established EUV source (ASML, NXE:3100) and show that patterns can potentially be produced at comparable speeds. Finally we present an extension of the grid based holography method for a grid of hexagonally shaped subcells. Our method can be used with any wave beam, including other matter wave beams such as helium ions or electrons.